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Proceedings Paper

Sizing algorithm with continuous customizable clipping
Author(s): Domingo Morales; Felipe Baytelman; Hugo Araya
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Paper Abstract

Polygon sizing is required during Mask Data Preparation in order to generate derived layers and as process bias to account for edge effects of etching. Two main features are required for polygon sizing algorithms to be useful in Mask Data Preparation software: correctness to avoid data corruption and clipping of the projection of acute angle vertices to limit connectivity modifications. However, current available solutions are either based on heuristics, producing corrupted results for certain input, or based on algorithms which may fail to maintain original design's connectivity for certain input. A novel algorithm including customizable clipping is presented.

Paper Details

Date Published: 17 October 2008
PDF: 11 pages
Proc. SPIE 7122, Photomask Technology 2008, 71224A (17 October 2008); doi: 10.1117/12.805595
Show Author Affiliations
Domingo Morales, Synopsys Chile Research and Development Ctr. (Chile)
Felipe Baytelman, Synopsys Chile Research and Development Ctr. (Chile)
Hugo Araya, Synopsys Chile Research and Development Ctr. (Chile)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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