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Proceedings Paper

Status of DPP EUV sources development for Beta/HVM
Author(s): Masaki Yoshioka; Peter Zink; Guido Schriever; Marc Corthout
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Paper Abstract

XTREME technologies and Philips EUV have provided the majority of available EUV sources based on Discharge Produced Plasma (DPP) technology worldwide since 2003. The fact that all existing prototype scanners make use of DPP sources and that further power scaling and debris mitigation upgrades are made according to plan clearly contributes to the maturity of this technology. We will present the latest status of our tin based DPP sources in the joint development work of XTREME technologies and Philips EUV. Demonstration experiments pave the way for this technology towards the HVM power level.

Paper Details

Date Published: 4 December 2008
PDF: 12 pages
Proc. SPIE 7140, Lithography Asia 2008, 71401F (4 December 2008); doi: 10.1117/12.804687
Show Author Affiliations
Masaki Yoshioka, XTREME technologies GmbH (Germany)
Peter Zink, Philips Extreme UV GmbH (Germany)
Guido Schriever, XTREME technologies GmbH (Germany)
Marc Corthout, Philips Extreme UV GmbH (Germany)


Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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