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Proceedings Paper

The first on-site evaluation of a new filter optimized for TARC and developer
Author(s): Toru Umeda; Takeo Ishibashi; Atsushi Nakamura; Junichi Ide; Masaru Nagano; Koichi Omura; Shuichi Tsuzuki; Toru Numaguchi
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Paper Abstract

In previous studies, we identified filter properties that have a strong effect on microbubble formation on the downstream side of the filter membrane. A new Highly Asymmetric Polyarylsulfone (HAPAS) filter was developed based on the findings. In the current study, we evaluated newly-developed HAPAS filter in environmentally preferred non-PFOS TARC in a laboratory setting. Test results confirmed that microbubble counts downstream of the filter were lower than those of a conventional HDPE filter. Further testing in a manufacturing environment confirmed that HAPAS filtration of TARC at point of use was able to reduce defectivity caused by microbubbles on both unpatterned and patterned wafers, compared with a HDPE filter.

Paper Details

Date Published: 4 December 2008
PDF: 7 pages
Proc. SPIE 7140, Lithography Asia 2008, 71402Z (4 December 2008); doi: 10.1117/12.804672
Show Author Affiliations
Toru Umeda, Nihon Pall Ltd. (Japan)
Takeo Ishibashi, Renesas Technology Corp. (Japan)
Atsushi Nakamura, Renesas Semiconductor Engineering Corp. (Japan)
Junichi Ide, Renesas Semiconductor Engineering Corp. (Japan)
Masaru Nagano, Renesas Semiconductor Engineering Corp. (Japan)
Koichi Omura, Renesas Semiconductor Engineering Corp. (Japan)
Shuichi Tsuzuki, Nihon Pall Ltd. (Japan)
Toru Numaguchi, Nihon Pall Ltd. (Japan)

Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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