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Proceedings Paper

Exposure illuminance dependability in the lithography characteristic of color resist for LCD color filter
Author(s): Msanori Yashiro; Masaru Ohta
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Paper Abstract

It is known that the photolithography characteristic of the color resist film depends on the variety of the pigments and the exposure condition. Recently, the color filter containing the high density pigments is hoped to make the wide color gamut LCD panel. Then, it is very important to know the composition of the color resist film and the exposure condition to achieve a good balance between the color characteristic and the photolithography characteristic. In this experiment, it is shown that the photolithography characteristics of Red and Blue resist films don't depend on the exposure illuminance easily in a range narrower than the width of the mask for the reason that the UV light goes into deeply without being absorbed by the pigments. However, in a range wider than the width of the mask or at very low exposure illuminance, their characteristics depend on the exposure illuminance by reason that the amount of the light irradiation decreases and the influence of the inhibition by oxygen becomes larger. On the other hand, it is shown that the photolithography characteristic of Green resist film depends on the exposure illuminance regardless of a range and the exposure illuminance value because the UV light can not go deeply into the coating by being absorbed by pigments in the resist. Thus, it is confirmed that the degree of curing and the pattern profile of color resist film is greatly different according to the composition and exposure condition.

Paper Details

Date Published: 4 December 2008
PDF: 9 pages
Proc. SPIE 7140, Lithography Asia 2008, 71402M (4 December 2008); doi: 10.1117/12.804645
Show Author Affiliations
Msanori Yashiro, Toyo Ink Mfg. Co., Ltd. (Japan)
Masaru Ohta, Toyo Ink Mfg. Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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