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Proceedings Paper

Optimizing integrated optical CD monitoring by floating pre-process variations in a complex multi-layer structure
Author(s): Marlene Strobl; Lisa Huang; Allen Li; Ying Luo; Youxian Wen
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Paper Abstract

Historically, in a volume production environment, process induced variation in optical property (n&k) of film stack was not significant for the most of applications using scatterometry. Many papers presented before addressed the CD variation in the production by adopting the fixed optical property approach [1-8]. However, with shrinkage of device size, and introduction of new material and process, n&k variation of some critical layers can not be ignored. In this paper, it presents impacts on measured optical CD due to n&k variation of one critical film in a 70nm DRAM ArF lithography process at a patterned area (A-layer). A solution to minimize the impacts using floating n&k in the scatterometry model is discussed, developed and verified.

Paper Details

Date Published: 1 December 2008
PDF: 12 pages
Proc. SPIE 7140, Lithography Asia 2008, 71400G (1 December 2008); doi: 10.1117/12.804636
Show Author Affiliations
Marlene Strobl, Inotera Memories Inc. (Taiwan)
Lisa Huang, Inotera Memories Inc. (Taiwan)
Allen Li, Tokyo Electron Taiwan Ltd. (Taiwan)
Ying Luo, Timbre Technology, Inc. (United States)
Youxian Wen, Timbre Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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