Share Email Print
cover

Proceedings Paper

The noble resists composed of cationic and anionic polymerizable PAGs
Author(s): Jung Hoon Oh; Dong Chul Seo; Hyun Sang Joo; Sung Do Jung; Jin Ho Kim; Seung Jae Lee; Ran Ra Park; JoonHee Han; Joo Hyeon Park
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A recent new class of resists referred to as polymer-bound PAG resists, which have slightly increased PAG loading and reduced photo acid diffusion relative to tranditional blended CAR systems have shown promise in improving resolution, faster photospeed, higher stablility and LER. we have developed two kinds of PAG, which are cationic and anionic polymerizable PAGs. One is that the polymer backbone is directly connected with cationic part in PAG and the other is that the polymer backbone is directly connected with anionic part in PAG. In this study we described the synthetic process of polymerizable PAGs and the polymerization process to make PAG-bound polymers and then, the lithography properties of resists composed of PAG-bound polymer were reffed to.

Paper Details

Date Published: 4 December 2008
PDF: 9 pages
Proc. SPIE 7140, Lithography Asia 2008, 714031 (4 December 2008); doi: 10.1117/12.804631
Show Author Affiliations
Jung Hoon Oh, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Dong Chul Seo, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Hyun Sang Joo, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Sung Do Jung, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Jin Ho Kim, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Seung Jae Lee, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Ran Ra Park, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
JoonHee Han, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)
Joo Hyeon Park, Korea Kumho Petrochemical Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

© SPIE. Terms of Use
Back to Top