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Proceedings Paper

Photothermal measurement of absorption and wavefront deformations in fused silica
Author(s): K. Mann; A. Bayer; J. Gloger; U. Leinhos; T. Rousseau; B. Schäfer
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Paper Abstract

'Thermal lenses' in fused silica due to absorbed UV laser radiation can diminish the achievable spatial resolution of the lithographic process in semiconductor wafer steppers. We developed a measurement system for spatially resolved registration of induced wavefront deformations, utilizing a Hartmann-Shack wavefront sensor with extreme sensitivity (λ/10,000). The photo-thermal technique can be employed for a rapid assessment of the material quality, since the wavefront deformation is directly proportional to the absorption losses. Along with a description of this new technique, we present results from photo-thermal measurements on fused silica under 193nm irradiation, as well as a comparison with thermal theory.

Paper Details

Date Published: 30 December 2008
PDF: 11 pages
Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71321F (30 December 2008); doi: 10.1117/12.804565
Show Author Affiliations
K. Mann, Laser-Lab. Göttingen e.V. (Germany)
A. Bayer, Laser-Lab. Göttingen e.V. (Germany)
J. Gloger, Laser-Lab. Göttingen e.V. (Germany)
U. Leinhos, Laser-Lab. Göttingen e.V. (Germany)
T. Rousseau, Laser-Lab. Göttingen e.V. (Germany)
B. Schäfer, Laser-Lab. Göttingen e.V. (Germany)

Published in SPIE Proceedings Vol. 7132:
Laser-Induced Damage in Optical Materials: 2008
Gregory J. Exarhos; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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