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Proceedings Paper

The impact of illuminator signatures on optical proximity effects
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Paper Abstract

Low pass filtering taking place in the projection tools used by the IC industry leads to a range of optical proximity effects, OPEs, resulting in undesired characteristics of patterns projected by the scanners. Commonly used scanner imaging models are capable of capturing OPEs driven by the fundamental imaging conditions such as wavelength, illuminator layout, reticle technology, and lens numerical aperture.

Paper Details

Date Published: 4 December 2008
PDF: 10 pages
Proc. SPIE 7140, Lithography Asia 2008, 71402A (4 December 2008); doi: 10.1117/12.804488
Show Author Affiliations
Jacek K. Tyminski, Nikon Precision Inc. (United States)
Stephen P. Renwick, Nikon Precision Inc. (United States)

Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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