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Proceedings Paper

Formation of a photo-oxidized protective thin film with waterproof and high-power laser tolerance properties
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Paper Abstract

The organic silicone oil applied over the surface of a fused silica glass or Kaliumdihydrogenphosphat (KDP) nonlinear optical crystal was changed to an inorganic glass by the photochemical oxidization using a Xe2 excimer lamp in the air. As a result, the thin film acquired a characteristic of high power laser tolerance equivalent to quartz. Dimethylsiloxane silicone oil was spin-coated on the surfaces of a fused silica substrate and KDP to form a film of 100-nm thickness; which were irradiated with the Xe2 excimer lamp light (wavelength 172 nm, power density 10 mW/cm2) for 60 minutes in oxygen atmosphere. The films were further irradiated with the Nd: YAG laser of ω (1.06 μm) or 2ω (0.503 μm), and the laser damage test (J/cm2/10 ns) was conducted. The laser damage threshold of the photo-oxidized 100 nm thick film formed on the fused silica substrate was 72 J/cm2 in ω and 107 J/cm2 in 2ω. On the KDP substrate, the laser damage threshold of the thin film was 32.4J/cm2 in ω and 32.6 J/cm2 in 2ω.

Paper Details

Date Published: 30 December 2008
PDF: 8 pages
Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71320K (30 December 2008); doi: 10.1117/12.804435
Show Author Affiliations
Masataka Murahara, Tokyo Institute of Technology (Japan)
Yuji Sato, Tokyo Institute of Technology (Japan)
Takayuki Funatsu, Tokyo Institute of Technology (Japan)
Takahisa Jitsuno, Osaka Univ. (Japan)
Yoshiaki Okamoto, Okamoto Optics Co. (Japan)


Published in SPIE Proceedings Vol. 7132:
Laser-Induced Damage in Optical Materials: 2008
Gregory J. Exarhos; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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