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Proceedings Paper

SiO2/HfO2 multilayers: impact of process parameters and stack geometry on the optical and structural properties
Author(s): D. Patel; P. Langston; A. Markosyan; E. M. Krous; B. Langdon; F. Furch; B. Reagan; R. Route; M. M. Fejer; J. J Rocca; C. S. Menoni
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Paper Abstract

We present a complete systematic study on the effect of assist beam energy on SiO2/HfO2 quarter wave stacks deposited by dual ion beam sputter (DIBS) deposition. Increasing assist beam energy results in lower surface roughness and reduced micro-crystallinity. The coatings also show reduced mechanical stress. The improvements in the structural properties are accompanied by a reduction in the absorption loss and an increase in the laser resistance to damage at 1 μm.

Paper Details

Date Published: 30 December 2008
PDF: 6 pages
Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 71320L (30 December 2008); doi: 10.1117/12.804434
Show Author Affiliations
D. Patel, Colorado State Univ. (United States)
P. Langston, Colorado State Univ. (United States)
A. Markosyan, Stanford Univ. (United States)
E. M. Krous, Colorado State Univ. (United States)
B. Langdon, Colorado State Univ. (United States)
F. Furch, Colorado State Univ. (United States)
B. Reagan, Colorado State Univ. (United States)
R. Route, Stanford Univ. (United States)
M. M. Fejer, Stanford Univ. (United States)
J. J Rocca, Colorado State Univ. (United States)
C. S. Menoni, Colorado State Univ. (United States)


Published in SPIE Proceedings Vol. 7132:
Laser-Induced Damage in Optical Materials: 2008
Gregory J. Exarhos; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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