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Proceedings Paper

Solvent effect on optical limiting and anti-damage properties of dicyanomethylene derivatives at 1064nm
Author(s): Jinxin Guan; Yuxia Zhao; Feipeng Wu; Xiangyun Fang; Junfang Zhao
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Paper Abstract

A number of optical limiting effects of organic compounds related to two-photon absorption (TPA) processes have been reported recent years. Actually, very large TPA cross-sections (σ) above thousands GM are obtained. However, the anti-damage property of organic compounds is still a problem, which limits their application on high power lasers. Thus, to increase the anti-damage property of organic compounds is important. Dicyanomethylene (DCM) is a strong electron acceptor. Some reported DCM derivatives show good stability and nonlinear optical activity. In this work, we investigate the optical limiting and anti-damage properties of two novel DCM derivatives in different solvents by nonlinear transmission method using femtosecond 1064 nm laser as excitation source. The results show that solvents have distinct effects on both damage threshold and TPA capability of compounds, indicating the solvent selection is very important. Moreover, an interesting phenomenon is observed that a linear absorption appears after damage threshold for both compounds in all solvents, which is supposed due to TPA induced excited absorption. More detailed discussions are presented.

Paper Details

Date Published: 30 December 2008
PDF: 9 pages
Proc. SPIE 7132, Laser-Induced Damage in Optical Materials: 2008, 713213 (30 December 2008); doi: 10.1117/12.804410
Show Author Affiliations
Jinxin Guan, Technical Institute of Physics and Chemistry (China)
Graduate School of the Chinese Academy of Sciences (China)
Yuxia Zhao, Technical Institute of Physics and Chemistry (China)
Feipeng Wu, Technical Institute of Physics and Chemistry (China)
Xiangyun Fang, Technical Institute of Physics and Chemistry (China)
Junfang Zhao, Technical Institute of Physics and Chemistry (China)


Published in SPIE Proceedings Vol. 7132:
Laser-Induced Damage in Optical Materials: 2008
Gregory J. Exarhos; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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