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Proceedings Paper

Optimization of optical properties of silicon-based anti-reflective spin-on hardmask materials
Author(s): Sang Kyun Kim; Hyeon Mo Cho; Changsoo Woo; Sang Ran Koh; Mi-Young Kim; Hui Chan Yoon; Woojin Lee; Seung-Wook Shin; Jong-Seob Kim; Tuwon Chang
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Paper Abstract

In the current semiconductor industry, hardmasks have become essential for successful patterning in many applications. Silicon-based anti-reflective spin-on hardmask (Si-SOH), which can be built by spin-on coating, is desirable in terms of mass production throughput and cost of ownership. As the design rule shrinks, the thickness of photoresist also becomes thinner, which forces the thickness of Si-SOH to be thinner resulting in a tighter thickness margin. In this case, controlling of optical properties of Si-SOH is important in order to obtain low reflectivity in the exposure process. Previously, we reported papers on silicon-based anti-reflective spin-on hardmask materials for 193 nm lithography and immersion ArF lithography. In this paper, the technique for optimization of optical properties, especially n and k values, of Si-SOH is described. To control n and k values, several chromophores were screened and the ratio among them was optimized. Although the amount of chromophores increased and the silicon contents decreased, our etch resistance enhancement technique allowed Si-SOH to have sufficient etch resistance. Characterization of this Si-SOH and lithographic performance using these materials are described in detail.

Paper Details

Date Published: 4 December 2008
PDF: 7 pages
Proc. SPIE 7140, Lithography Asia 2008, 71402V (4 December 2008); doi: 10.1117/12.804399
Show Author Affiliations
Sang Kyun Kim, Samsung Cheil Industries, Inc. (South Korea)
Hyeon Mo Cho, Samsung Cheil Industries, Inc. (South Korea)
Changsoo Woo, Samsung Cheil Industries, Inc. (South Korea)
Sang Ran Koh, Samsung Cheil Industries, Inc. (South Korea)
Mi-Young Kim, Samsung Cheil Industries, Inc. (South Korea)
Hui Chan Yoon, Samsung Cheil Industries, Inc. (South Korea)
Woojin Lee, Samsung Cheil Industries, Inc. (South Korea)
Seung-Wook Shin, Samsung Cheil Industries, Inc. (South Korea)
Jong-Seob Kim, Samsung Cheil Industries, Inc. (South Korea)
Tuwon Chang, Samsung Cheil Industries, Inc. (South Korea)


Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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