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Proceedings Paper

Reducing capital and labor costs of 193nm lithography monitoring of airborne molecular contamination (AMC) through proactive assessment and implementation of AMC monitoring techniques and strategies
Author(s): Steven Rowley; Jerry Yang; Andy Wei
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Paper Abstract

Two methods for monitoring acid/base airborne molecular contamination (AMC) in 193nm lithography exposure tools, tracks, and process bays have historically been used for cleanroom and process contamination control. Ion Mobility Spectrometry (IMS) is a predominant technique used by semiconductor manufacturers for real-time AMC detection allowing for identification of subtle trends in AMC levels over time or alarming during high concentration events. Manual impinger sampling with ion chromatography (IC) analysis is a second technique used which pre-concentrates the air sample to allow for low detection limits and allows for some increased speciation of ions. The use of one or both of these techniques has a significant impact on the effectiveness of AMC detection and control, therefore, the equipment and strategy used within an AMC monitoring program can provide large competitive advantages that are not easily or quickly duplicated by other companies.

Paper Details

Date Published: 4 December 2008
PDF: 9 pages
Proc. SPIE 7140, Lithography Asia 2008, 71400U (4 December 2008); doi: 10.1117/12.803919
Show Author Affiliations
Steven Rowley, Particle Measuring Systems, Inc. (United States)
Jerry Yang, Sunway Scientific Corporation (Taiwan)
Andy Wei, Sunway Scientific Corporation (Taiwan)


Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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