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Proceedings Paper

Flexible sensitivity inspection with TK-CMI software for criticality-awareness
Author(s): Frank A. J. M. Driessen; Jamila Gunawerdana; Yakuko Saito; Hideo Tsuchiya; Yoshitake Tsuji
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Paper Abstract

In this paper we present the method that NuFlare photomask inspection systems can use to strongly reduce pseudo detections by use of TK-CMI software. The NuFlare inspection system is capable to detect the smallest defects in the 45 and 32-nm nodes and has recently been introduced to production. It links up with a compute cluster with Takumi's Criticality-Marker Information software (TK-CMI). TK-CMI quickly analyzes the ~200GB post-OPC layout or multi-layer pre-OPC layout and assigns various types of criticality regions. The basic set of criticalities is made to address the challenges that typical maskmakers experience. The TKCMI system also supports design-intent-based criticalities. The NuFlare inspection system uses this full-mask criticality information and generates flexible inspection recipes that inspect low-criticality areas with relaxed sensitivity resulting in reduction of pseudo detections in such regions.

Paper Details

Date Published: 17 October 2008
PDF: 9 pages
Proc. SPIE 7122, Photomask Technology 2008, 712222 (17 October 2008); doi: 10.1117/12.803593
Show Author Affiliations
Frank A. J. M. Driessen, Takumi Technology Corp. (United States)
Jamila Gunawerdana, Takumi Technology Corp. (United States)
Yakuko Saito, NuFlare Technology, Inc. (Japan)
Hideo Tsuchiya, NuFlare Technology, Inc. (Japan)
Yoshitake Tsuji, Advanced Mask Inspection Technology, Inc. (Japan)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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