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Proceedings Paper

Central hole effect on Whispering-Gallery-Mode of triangular lattice photonic crystal microcavity
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Paper Abstract

Whispering-Gallery-Mode (WGM) photonic crystal microcavity is a kind of photonic crystal application and can potentially be used for miniaturized photonic devices, such as thresholdless lasers. In this paper we study the WGM of photonic crystal microcavities focusing on the so called H2 cavities which are formed by removing seven air holes. The WGM in these large-size cavities has some advantages compared with single defect WGM in the view of real device applications. We further add a central air hole in the cavity region to analyze the effect on WGM in the microcavity by finite difference time domain (FDTD) and plane wave expansion (PWE). It is found that the tolerance of WGM is large enough for the fabrication of electrical injection structure.

Paper Details

Date Published: 18 November 2008
PDF: 7 pages
Proc. SPIE 7135, Optoelectronic Materials and Devices III, 71353K (18 November 2008); doi: 10.1117/12.803240
Show Author Affiliations
Guangyu Liu, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Yongqiang Ning, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Te Li, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Jinjiang Cui, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Yan Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Xing Zhang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Zhenfu Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)
Graduate School of the Chinese Academy of Sciences (China)
Lijun Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China)


Published in SPIE Proceedings Vol. 7135:
Optoelectronic Materials and Devices III
Yi Luo; Jens Buus; Fumio Koyama; Yu-Hwa Lo, Editor(s)

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