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Proceedings Paper

Technological processes of grating light valve as diffractive spatial light modulator in laser phototypesetting system
Author(s): Wei Zhang; Yu Geng; Changlun Hou; Guoguang Yang; Jian Bai
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Paper Abstract

Grating Light Valve (GLV) is a kind of optics device based on Micro-Opto-Electro-Mechanical System (MOEMS) technology, utilizing diffraction principle to switch, attenuate and modulate light. In this paper, traditional GLV device's structure and its working principle are illuminated, and a kind of modified GLV structure is presented, with details introduction of the fabrication technology. The GLV structure includes single crystal silicon substrate, silicon dioxide isolating layer, aluminum layer of fixed ribbons and silicon nitride of movable ribbons. In the fabrication, lots of techniques are adopted, such as low-pressure chemical vapor deposition (LPCVD), photolithography, etching and evaporation. During the fabrication processes, Photolithography is a fundamental and fatal technology, which determines etching result and GLV quality. Some methods are proposed through repeated experiments, to improve etching result greatly and guide the practical application. This kind of GLV device can be made both small and inexpensively, and has been tested to show proper range of actuation under DC bias, with good performance. The GLV device also has merits such as low cost, simple technology, high fill ratio and low driving voltage. It can properly be well used and match the demands of high light power needed in laser phototypesetting system, as a high-speed, high-resolution light modulator.

Paper Details

Date Published: 18 November 2008
PDF: 9 pages
Proc. SPIE 7135, Optoelectronic Materials and Devices III, 71353H (18 November 2008); doi: 10.1117/12.803120
Show Author Affiliations
Wei Zhang, Zhejiang Univ. (China)
Yu Geng, Zhejiang Univ. (China)
Changlun Hou, Zhejiang Univ. (China)
Guoguang Yang, Zhejiang Univ. (China)
Jian Bai, Zhejiang Univ. (China)


Published in SPIE Proceedings Vol. 7135:
Optoelectronic Materials and Devices III
Yi Luo; Jens Buus; Fumio Koyama; Yu-Hwa Lo, Editor(s)

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