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Proceedings Paper

Manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities
Author(s): Nikolay I. Chkhalo; Evgeniy B. Kluenkov; Aleksey E. Pestov; Denis G. Raskin; Nikolay N. Salashchenko; Mikhail N. Toropov
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Paper Abstract

Status of activities in field of manufacturing and investigation of objective lens for ultrahigh resolution lithography facilities carrying out in IPM RAS is reported. Some physical aspects of operation of interferometers with diffraction reference wave are considered. A scheme of a point diffraction interferometer developed in IPM is presented. Last experimental data on making high precision spherical substrates with NA=0.25 are presented. A problem of surface shape measurements of aspherical substrates with a help of a point diffraction interferometer is discussed. A scheme of measurements and experimental data of wave deformation of 6-lens objective are given.

Paper Details

Date Published: 29 April 2008
PDF: 6 pages
Proc. SPIE 7025, Micro- and Nanoelectronics 2007, 702505 (29 April 2008); doi: 10.1117/12.802351
Show Author Affiliations
Nikolay I. Chkhalo, Institute for Physics of Microstructures (Russia)
Evgeniy B. Kluenkov, Institute for Physics of Microstructures (Russia)
Aleksey E. Pestov, Institute for Physics of Microstructures (Russia)
Denis G. Raskin, Institute for Physics of Microstructures (Russia)
Nikolay N. Salashchenko, Institute for Physics of Microstructures (Russia)
Mikhail N. Toropov, Institute for Physics of Microstructures (Russia)


Published in SPIE Proceedings Vol. 7025:
Micro- and Nanoelectronics 2007

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