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Proceedings Paper

UV lithographic patterning on spin-coated DNA thin-films
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Paper Abstract

Photopatterning with 266 nm UV light was accomplished on spin-coated DNA thin films using two different techniques. Lithographic masks were used to create 10-100 micron-sized arrays of enhanced hydrophilicity. Two such masks were used: (1) Polka Dot Filter having opaque squares and a transparent grid and (2) A metal wire-mesh having transparent squares and opaque grid. UV light selectively photodissociates the DNA film where it is exposed into smaller more hydrophilic fragments. UV-exposed films are then coated with a solution of a protein. The protein appears to selectively coat over areas exposed to UV light. We have also used interferometric lithography with UV light to accomplish patterning on the scale of 1 micron on DNA thin films. This technique has the potential to generate micro/nano arrays and vary the array-size. This paper describes the fabrication of these microarrays and a plausible application for fabricating antibody arrays for protein sensing applications.

Paper Details

Date Published: 9 September 2008
PDF: 5 pages
Proc. SPIE 7040, Nanobiosystems: Processing, Characterization, and Applications, 70400E (9 September 2008); doi: 10.1117/12.802222
Show Author Affiliations
Darnell E. Diggs, Air Force Research Lab. (United States)
James G. Grote, Air Force Research Lab. (United States)
Carrie Bartsch, Air Force Research Lab. (United States)
Fahima Ouchen, Air Force Research Lab. (United States)
Anup Sharma, Alabama A&M Univ. (United States)
J. M. Taguenang, Alabama A&M Univ. (United States)
Aschalew Kassu, Alabama A&M Univ. (United States)
Redahegn Sileshi, Alabama A&M Univ. (United States)


Published in SPIE Proceedings Vol. 7040:
Nanobiosystems: Processing, Characterization, and Applications
Emily M. Heckman; Thokchom Birendra Singh; Junichi Yoshida, Editor(s)

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