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Proceedings Paper

White light interferometry for vertical artifact calibration
Author(s): V. Damian; Mihaela Bojan; A. Sima; Dana Cristea; A. Dinescu; Raluca Muller
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Paper Abstract

In this paper we describe a traceable to the meter standard method to measure the height of an artifact used as a calibrator for observation instruments in nanotechnologies and nanosciences. The artifact is a grating specially manufactured so that its features (height, pitch, width, wall angles) are highly uniform across its area. A Linnik microscope designed for longitudinal (vertical) measurements using the principle of white light interferometry was used to determine the height of the grating. To insure the traceability of the measurements a laser source of known wavelength was used and the measurements obtained using white light were calibrated to it. The experimental data was statistically analyzed and the measurement precision was estimated to be in the range of nanometers. The data were compared with the results obtained using the TIC method with a Carl Zeiss microscope.

Paper Details

Date Published: 29 April 2008
PDF: 6 pages
Proc. SPIE 7007, INDLAS 2007: Industrial Laser Applications, 70070J (29 April 2008); doi: 10.1117/12.801969
Show Author Affiliations
V. Damian, National Institute for Laser, Plasma and Radiation Physics (Romania)
Mihaela Bojan, National Institute for Laser, Plasma and Radiation Physics (Romania)
A. Sima, National Institute for Laser, Plasma and Radiation Physics (Romania)
Dana Cristea, National Institute for Microtechnologies (Romania)
A. Dinescu, National Institute for Microtechnologies (Romania)
Raluca Muller, National Institute for Microtechnologies (Romania)

Published in SPIE Proceedings Vol. 7007:
INDLAS 2007: Industrial Laser Applications
Mircea Udrea, Editor(s)

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