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Proceedings Paper

Characterization of binary and attenuated phase shift mask blanks for 32nm mask fabrication
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Paper Abstract

During the development of optical lithography extensions for 32nm, both binary and attenuated phase shift Reticle Enhancement Technologies (RETs) were evaluated. The mask blank has a very strong influence on the minimum feature size and critical dimension (CD) performance that can be achieved on the finished reticle and can have a significant impact on the ultimate wafer lithographic performance. Development of a suitable high resolution binary mask making process was particularly challenging. Standard chrome on glass (COG) binary blanks with 70 nm thick chrome films were unable to support the required minimum feature size, linearity, and through pitch requirements. Two alternative mask blank configurations were evaluated for use in building high resolution binary masks: a binary (BIN) mask blank based on the standard attenuated PSM blank and an Opaque MoSi on Glass (OMOG) mask blank consisting of a newly- developed opaque MoSi [1]. Data comparing the total process bias, minimum feature size, CD uniformity, linearity, through pitch, etch loading effects, flatness, film stress, cleaning durability and radiation durability performance of the different binary and attenuated PSM mask blanks are reported. The results show that the new OMOG binary blank offers significant mask performance benefits relative to the other binary and attenuated PSM mask blanks. The new OMOG blank was the opaque mask blank candidate most capable of meeting 32nm binary mask fabrication requirements..

Paper Details

Date Published: 17 October 2008
PDF: 12 pages
Proc. SPIE 7122, Photomask Technology 2008, 712209 (17 October 2008); doi: 10.1117/12.801950
Show Author Affiliations
Thomas Faure, IBM Corp. (United States)
Emily Gallagher, IBM Corp. (United States)
Michael Hibbs, IBM Corp. (United States)
Louis Kindt, IBM Corp. (United States)
Ken Racette, IBM Corp. (United States)
Richard Wistrom, IBM Corp. (United States)
Amy Zweber, IBM Corp. (United States)
Alfred Wagner, IBM Corp. (United States)
Yasutaka Kikuchi, Toppan Photomasks, Inc. (United States)
Toru Komizo, Toppan Photomasks, Inc. (United States)
Satoru Nemoto, Toppan Photomasks, Inc. (United States)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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