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Proceedings Paper

Evaluation of e-beam repair for nanoimprint templates
Author(s): Marcus Pritschow; Volker Boegli; Joerg Butschke; Mathias Irmscher; Douglas Resnick; Holger Sailer; Kosta Selinidis; Ecron Thompson
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Paper Abstract

Two essential process steps of the template fabrication chain are inspection and repair. The widely introduced gas assisted e-beam etching and deposition technique for mask repair offers crucial advantages, especially regarding the resolution capability. We started the evaluation of a new e-beam repair test stand based on the Zeiss MeRiT technology for UV-NIL template repair. For this purpose, templates with programmed defects of different shapes and sizes have been designed and fabricated. The repair experiments were focused on the development of recipes for quartz etching and deposition specifically tailored for NIL repair requirements Both, clear and opaque programmed defects have been repaired and the results have been analyzed. After recipe optimization, templates with repaired programmed defects have been imprinted on a Molecular Imprints Imprio 250 tool. By comparing template and imprint results we investigated the repair capability.

Paper Details

Date Published: 17 October 2008
PDF: 12 pages
Proc. SPIE 7122, Photomask Technology 2008, 71222L (17 October 2008); doi: 10.1117/12.801946
Show Author Affiliations
Marcus Pritschow, IMS Chips (Germany)
Volker Boegli, NaWoTec GmbH (Germany)
Joerg Butschke, IMS Chips (Germany)
Mathias Irmscher, IMS Chips (Germany)
Douglas Resnick, Molecular Imprints, Inc. (United States)
Holger Sailer, IMS Chips (Germany)
Kosta Selinidis, Molecular Imprints, Inc. (United States)
Ecron Thompson, Molecular Imprints, Inc. (United States)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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