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Proceedings Paper

Miniaturized multilayer dielectric coatings using metal masks fabricated by electroforming and photolithography technologies
Author(s): Cheng-Chung Jaing; Chii-Rong Yang; Chun-Ming Chang; Yung-Hsin Chang; Chao-Te Lee; Chine-Nan Hsiao
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Paper Abstract

The Ni films replacing photoresist serve as a mask to selectively deposit optical thin films at a substrate temperature of 300°C by an electron-beam gun evaporation. The photolithograph is used to define the growth of Ni films by an electroforming technique. Mosaic patterns with a width of 20&mgr;m are chosen as an arrangement of red color filters. The red filters are formed of alternate SiO2 and TiO2 layers and the average transmittance of red filters is larger than 90%. The experimental results successfully illustrate that the combinative uses of photolithography, electroforming and electron-beam gun evaporation can make miniaturized multilayer dielectric coatings with high light transmittance in a hot deposition.

Paper Details

Date Published: 29 August 2008
PDF: 7 pages
Proc. SPIE 7067, Advances in Thin-Film Coatings for Optical Applications V, 70670P (29 August 2008); doi: 10.1117/12.801626
Show Author Affiliations
Cheng-Chung Jaing, Ming Hsin Univ. of Science and Technology (Taiwan)
Chii-Rong Yang, National Taiwan Normal Univ. (Taiwan)
Chun-Ming Chang, National Taiwan Normal Univ. (Taiwan)
Instrument Technology Research Ctr. (Taiwan)
Yung-Hsin Chang, Instrument Technology Research Ctr. (Taiwan)
Chao-Te Lee, Instrument Technology Research Ctr. (Taiwan)
Chine-Nan Hsiao, Instrument Technology Research Ctr. (Taiwan)

Published in SPIE Proceedings Vol. 7067:
Advances in Thin-Film Coatings for Optical Applications V
Jennifer D. T. Kruschwitz; Michael J. Ellison, Editor(s)

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