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Proceedings Paper

E-beam exposure system using multi column cell (MCC) with CP for mask writing
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Paper Abstract

In the Mask D2I project at ASET, the authors designed a novel electron beam exposure system using the concepts of MCC (multi column cell), CP (character projection), and VSB (variable shaped beam) to improve the throughput of electron beam exposure systems. They presented outlines of a proof-of-concept system of MCC, and have shown the performances of VSB and CP in the system. They evaluated the impacts on beam position in one column cell caused by deflections in another column cell. The impacts were found to be less than 0.1nm in presence of major deflections in the neighboring column cell. Hence it was concluded that there was no noticeable impact on deflections cause by the neighboring column cells in the MCC system.

Paper Details

Date Published: 17 October 2008
PDF: 8 pages
Proc. SPIE 7122, Photomask Technology 2008, 71220K (17 October 2008); doi: 10.1117/12.801564
Show Author Affiliations
Akio Yamada, Association of Super-Advanced Electronics Technologies (Japan)
Hiroshi Yasuda, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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