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Proceedings Paper

Advanced process capabilities for electron beam based photomask repair in a production environment
Author(s): Anthony Garetto; Christof Baur; Jens Oster; Markus Waiblinger; Klaus Edinger
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Paper Abstract

The cost and time associated with the production of photolithographic masks continues to grow, driven by the ever decreasing feature size, advanced mask technologies and complex resolution enhancing techniques. Thus employment of a high-resolution, comprehensive mask repair tool becomes a key element for a successful production line. The MeRiT® utilizes electron beam induced chemistry to repair both clear and opaque defects on a variety of masks and materials with the highest available resolution and edge placement precision. This paper describes the benefits of the electron beam induced technique as employed by the MeRiT® system for a production environment.

Paper Details

Date Published: 17 October 2008
PDF: 7 pages
Proc. SPIE 7122, Photomask Technology 2008, 71221K (17 October 2008); doi: 10.1117/12.801554
Show Author Affiliations
Anthony Garetto, Carl Zeiss SMT, Inc. (United States)
Christof Baur, NaWoTec GmbH (Germany)
Jens Oster, NaWoTec GmbH (Germany)
Markus Waiblinger, Carl Zeiss SMS GmbH (Germany)
Klaus Edinger, NaWoTec GmbH (Germany)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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