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Proceedings Paper

Tunable droplet momentum and cavitation process for damage-free cleaning of challenging particles
Author(s): Roman Gouk; James Papanu; Fred Li; Jason Jeon; Tong Liu; Rao Yalamanchili
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Paper Abstract

Particle removal without damage has been demonstrated for <60nm photomask sub-resolution assist features with droplet momentum cleaning technology that employs NanoDropletTM mixed-fluid jet nozzle. Although 99%+ particle removal efficiency can be achieved for standard Si3N4 particles with broad size distribution, there are some cleaning challenges with small (<100nm) and large contact area (>500nm) particles. It was found that tunable uniform cavitation can provide the additional physical assist force needed to improve cleaning efficiency of these challenging particles while meeting the damage-fee cleaning requirement. An integrated cleaning process was developed that combines both droplet momentum and damage-free cavitation technology. Cleaning tests were performed with different types of challenging particles. The results showed 5-8% particle removal efficiency improvement as compared to momentum based only cleaning. All masks were processed using the TetraTM mask cleaning tool configured with NanoDropletTM mixed fluid jet technology and full face megasonics.

Paper Details

Date Published: 17 October 2008
PDF: 10 pages
Proc. SPIE 7122, Photomask Technology 2008, 712211 (17 October 2008); doi: 10.1117/12.801549
Show Author Affiliations
Roman Gouk, Applied Materials (United States)
James Papanu, Applied Materials (United States)
Fred Li, Applied Materials (United States)
Jason Jeon, Applied Materials (United States)
Tong Liu, Applied Materials (United States)
Rao Yalamanchili, Applied Materials (United States)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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