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Proceedings Paper

Compute resource management and turn around time control in mask data prep
Author(s): Travis Lewis; Scott Goad; Kenneth Jantzen; Ahmed Nouh; Minyoung Park; Emile Sahouria; Steffen Schulze
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Paper Abstract

With each new process technology node chip designs increase in complexity and size, and mask data prep flows require more compute resources to maintain the desired turn around time (TAT) at a low cost. Securing highly scalable processing for each element of the flow - geometry processing, resolution enhancements and optical process correction, verification and fracture - has been the focal point so far. The utilization for different flow elements depends on the operation, the data hierarchy and the device type. This paper introduces a dynamic utilization driven compute resource control system applied to large scale parallel computation environment. The paper will analyze performance metrics TAT and throughput for a production system and discuss trade-offs of different parallelization approaches in data processing regarding interaction with dynamic resource control. The study focuses on 65nm and 45nm designs.

Paper Details

Date Published: 17 October 2008
PDF: 8 pages
Proc. SPIE 7122, Photomask Technology 2008, 71222O (17 October 2008); doi: 10.1117/12.801544
Show Author Affiliations
Travis Lewis, AMD (United States)
Scott Goad, AMD (United States)
Kenneth Jantzen, Mentor Graphics Corp. (United States)
Ahmed Nouh, Mentor Graphics Corp. (United States)
Minyoung Park, Mentor Graphics Corp. (United States)
Emile Sahouria, Mentor Graphics Corp. (United States)
Steffen Schulze, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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