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Proceedings Paper

Empirical study of OPC metrology requirements for 32-nm node logic
Author(s): Brian S. Ward; Lena Zavylova; Peter de Bisschop; Jeroen van de Kerkhove
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Paper Abstract

We evaluate the relationship between the number of measurements used to create each data point in an OPC model data set and resulting model quality for target 32-nm logic node applications. Generated data sets will range from singlemeasurement, unfiltered data sets to many-measurement averages based on filtered results. Intermediate measurementcount averages will also be evaluated in an attempt to quantify the tradeoff between raw measurements per data point and resulting model quality. Finally, other variations will also be considered, such as automated versus manual data filtering. The auto-fitted OPC models will be compared to identify metrology recommendations for 32-nm logic node modeling.

Paper Details

Date Published: 17 October 2008
PDF: 10 pages
Proc. SPIE 7122, Photomask Technology 2008, 712242 (17 October 2008); doi: 10.1117/12.801458
Show Author Affiliations
Brian S. Ward, IMEC (Belgium)
Lena Zavylova, Synopsys (United States)
Peter de Bisschop, IMEC (Belgium)
Jeroen van de Kerkhove, IMEC (Belgium)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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