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Proceedings Paper

International photomask linewidth comparison by NIST and PTB
Author(s): J. Potzick; R. Dixson; R. Quintanilha; M. Stocker; A. Vladar; E. Buhr; W. Häßler-Grohne; B. Bodermann; C. G. Frase; H. Bosse
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Paper Abstract

In preparation of the international Nano1 linewidth comparison on photomasks between 9 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the suitability of the mask standards and the general approach to be used for the Nano1 comparison. This contribution describes the rationale of both comparisons, the design of the mask comparison standards to be used and the measurement methods applied for traceable photomask linewidth metrology at NIST and PTB.

Paper Details

Date Published: 17 October 2008
PDF: 14 pages
Proc. SPIE 7122, Photomask Technology 2008, 71222P (17 October 2008); doi: 10.1117/12.801435
Show Author Affiliations
J. Potzick, National Institute of Standards and Technology (United States)
R. Dixson, National Institute of Standards and Technology (United States)
R. Quintanilha, National Institute of Standards and Technology (United States)
M. Stocker, National Institute of Standards and Technology (United States)
A. Vladar, National Institute of Standards and Technology (United States)
E. Buhr, Physikalisch-Technische Bundesanstalt (Germany)
W. Häßler-Grohne, Physikalisch-Technische Bundesanstalt (Germany)
B. Bodermann, Physikalisch-Technische Bundesanstalt (Germany)
C. G. Frase, Physikalisch-Technische Bundesanstalt (Germany)
H. Bosse, Physikalisch-Technische Bundesanstalt (Germany)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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