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Proceedings Paper

Study of second-generation Proximity Gap Suction Development System (PGSD-II) for mask fabrication
Author(s): Hideaki Sakurai; Masatoshi Terayama; Mari Sakai; Masamitsu Itoh; Osamu Ikenaga; Hideo Funakoshi; Norifumi Sato; Kenji Nakamizo; Masato Nomura; Yoshihiko Saito; Junji Nakao; Naoya Hayashi
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Paper Abstract

Development process for 3x nm node devices and beyond is becoming a great issue in mask fabrication. The following items, such as uniformity, repeatability, loading effect and defect must be improved. To evolve the development process, TEL, DNP Omron and Toshiba have been jointly developed next generation equipment which is called "Second-generation PGSD (Gen.2)". In this paper, PGSD Gen.2 concept is introduced and its performance is reported.

Paper Details

Date Published: 17 October 2008
PDF: 12 pages
Proc. SPIE 7122, Photomask Technology 2008, 71220D (17 October 2008); doi: 10.1117/12.801424
Show Author Affiliations
Hideaki Sakurai, Toshiba Corp. (Japan)
Masatoshi Terayama, Toshiba Corp. (Japan)
Mari Sakai, Toshiba Corp. (Japan)
Masamitsu Itoh, Toshiba Corp. (Japan)
Osamu Ikenaga, Toshiba Corp. (Japan)
Hideo Funakoshi, Tokyo Electron Kyushu, Ltd. (Japan)
Norifumi Sato, Tokyo Electron Kyushu, Ltd. (Japan)
Kenji Nakamizo, Tokyo Electron Kyushu, Ltd. (Japan)
Masato Nomura, Tokyo Electron Kyushu, Ltd. (Japan)
Yoshihiko Saito, Tokyo Electron, Ltd. (Japan)
Junji Nakao, Omron Corp. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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