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Proceedings Paper

Mask process monitoring with optical CD measurements for sub-50-nm
Author(s): Kyung-Yoon Bang; Jin-Back Park; Jeong-Hun Roh; Dong-Hoon Chung; Sung-Yong Cho; Yong-Hoon Kim; Sang-Gyun Woo; Han-Ku Cho
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Paper Abstract

Process control of line width and etch depth on the photomask production is more important as the industry moves toward 50nm node and beyond. In this paper, we report the ellipsometer-based scatterometry based metrology system that provides line width and resist thickness measurements on sub 50 nm node test masks for a mask process monitoring. Measurements were made with spectroscopic rotating compensator ellipsometer system. For analysis we made up modeling libraries with a 200 nm half pitch and checked and applied them to ADI and ACI measurements of binary and phase shift mask (PSM). We characterized the CD uniformity, linearity, thickness uniformity. Results show that linearity measured from fixed-pitch, varying line/space ratio targets show good correlation to top-down CD-SEM with R2 of more than 0.99. Resist thickness results show that depth bias is about 2nm between AFM and OCD in ADI step. The data show that optical CD measurements provide a nondestructive way to monitor mask processes with relatively little time loss from measurement step.

Paper Details

Date Published: 17 October 2008
PDF: 8 pages
Proc. SPIE 7122, Photomask Technology 2008, 71222V (17 October 2008); doi: 10.1117/12.801416
Show Author Affiliations
Kyung-Yoon Bang, Samsung Electronics Co., Ltd. (Korea, Republic of)
Jin-Back Park, Samsung Electronics Co., Ltd. (Korea, Republic of)
Jeong-Hun Roh, Samsung Electronics Co., Ltd. (Korea, Republic of)
Dong-Hoon Chung, Samsung Electronics Co., Ltd. (Korea, Republic of)
Sung-Yong Cho, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Yong-Hoon Kim, Samsung Electronics Co., Ltd. (Korea, Republic of)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (Korea, Republic of)
Han-Ku Cho, Samsung Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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