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Proceedings Paper

Control of the sidewall angle of an absorber stack using the Faraday cage system for the change of pattern printability in EUVL
Author(s): Il-Yong Jang; Sung-Min Huh; Seong-Yong Moon; Sang-Gyun Woo; Jin-Kwan Lee; Sang Heup Moon; HanKu Cho
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Paper Abstract

A patterned TaN substrate, which is candidate for a mask absorber in extreme ultra-violet lithography (EUVL), was etched to have inclined sidewalls by using a Faraday cage system under the condition of a 2-step process that allowed the high etch selectivity of TaN over the resist. The sidewall angle (SWA) of the patterned substrate, which was in the shape of a parallelogram after etching, could be controlled by changing the slope of a substrate holder that was placed in the Faraday cage. The performance of an EUV mask, which contained the TaN absorber of an oblique pattern over the molybdenum/silicon multi-layer, was simulated for different cases of SWA. The results indicated that the optical properties, such as the critical dimension (CD), an offset in the CD bias between horizontal and vertical patterns (H-V bias), and a shift in the image position on the wafer, could be controlled by changing the SWA of the absorber stack. The simulation result showed that the effect of the SWA on the optical properties became more significant at larger thicknesses of the absorber and smaller sizes of the target CD. Nevertheless, the contrast of the aerial images was not significantly decreased because the shadow effect caused by either sidewall of the patterned substrate cancelled with each other.

Paper Details

Date Published: 17 October 2008
PDF: 8 pages
Proc. SPIE 7122, Photomask Technology 2008, 712228 (17 October 2008); doi: 10.1117/12.801413
Show Author Affiliations
Il-Yong Jang, Samsung Electronics Co., Ltd. (Korea, Republic of)
Sung-Min Huh, Samsung Electronics Co., Ltd. (Korea, Republic of)
Seong-Yong Moon, Samsung Electronics Co., Ltd. (Korea, Republic of)
Sang-Gyun Woo, Samsung Electronics Co., Ltd. (Korea, Republic of)
Jin-Kwan Lee, Seoul National Univ. (Korea, Republic of)
Sang Heup Moon, Seoul National Univ. (Korea, Republic of)
HanKu Cho, Samsung Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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