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Proceedings Paper

Nanomachining photomask repair of complex patterns
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Paper Abstract

Improvements in repair process, software, and AFM tip technology have brought about an overall 2D shape reconstruction capability to nanomachining that has not been previously imagined. Repair results are shown for various processes to highlight their relative strengths and weaknesses. The impact of technical improvements is shown in the advances in repair dimensional precision and overall imaging performance. The greater technical potential of nanomachining is realized in this examination for mask repair scaled to smaller repair geometries while repairing larger defects that may span these critical patterns.

Paper Details

Date Published: 17 October 2008
PDF: 11 pages
Proc. SPIE 7122, Photomask Technology 2008, 71221I (17 October 2008); doi: 10.1117/12.801297
Show Author Affiliations
Tod Robinson, RAVE LLC (United States)
Andrew Dinsdale, RAVE LLC (United States)
Mike Archuletta, RAVE LLC (United States)
Ron Bozak, RAVE LLC (United States)
Roy White, RAVE LLC (United States)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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