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Proceedings Paper

Benchmark of rigorous methods for electromagnetic field simulations
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Paper Abstract

We have developed an interface which allows to perform rigorous electromagnetic field (EMF) simulations with the simulator JCMsuite and subsequent aerial imaging and resist simulations with the simulator Dr.LiTHO.With the combined tools we investigate the convergence of near-field and far-field results for different DUV masks. We also benchmark results obtained with the waveguide-method EMF solver included in Dr.LiTHO and with the finite-element-method EMF solver JCMsuite. We demonstrate results on convergence for dense and isolated hole arrays, for masks including diagonal structures, and for a large 3D mask pattern of lateral size 10 microns by 10 microns.

Paper Details

Date Published: 17 October 2008
PDF: 12 pages
Proc. SPIE 7122, Photomask Technology 2008, 71221S (17 October 2008); doi: 10.1117/12.801248
Show Author Affiliations
Sven Burger, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Lin Zschiedrich, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Frank Schmidt, Zuse Institute Berlin (Germany)
JCMwave GmbH (Germany)
Peter Evanschitzky, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)


Published in SPIE Proceedings Vol. 7122:
Photomask Technology 2008
Hiroichi Kawahira; Larry S. Zurbrick, Editor(s)

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