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Proceedings Paper

A practical solution to the critical problem of 193 nm reticle haze
Author(s): David L. Halbmaier; Yasushi Ohyashiki; Oleg Kishkovich
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Paper Abstract

This paper summarizes the dramatic results achieved through the use of novel reticle haze prevention techniques and new equipment which have enabled these results. Near continuous XCDA® purge of reticle pods coupled with integrated pod purifiers resulted in the elimination of reticle haze defects for the usable production life of reticles.

Paper Details

Date Published: 19 May 2008
PDF: 7 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282G (19 May 2008); doi: 10.1117/12.799669
Show Author Affiliations
David L. Halbmaier, Entegris, Inc. (United States)
Yasushi Ohyashiki, Entegris, Inc. (United States)
Oleg Kishkovich, Entegris, Inc. (United States)

Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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