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Proceedings Paper

Determination of the optical constants and thickness of titanium oxide thin film by envelope method
Author(s): N. Witit-anun; P. Rakkwamsuk; P. Limsuwan
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Paper Abstract

Transparent titanium oxide thin film was deposited by DC reactive magnetron sputtering method onto glass slides and silicon wafer substrates. The film was characterized by AFM, XRD and spectrophotometer for film's thickness, crystallographic structure and transmission spectrum respectively. The film's thickness was, from AFM, found to be about 296 nm. XRD measurement shows that the film is crystallized in rutile phase. Absorption coefficient and the thickness of the films were calculated from interference of transmittance spectra. Optical constants such as refractive index (n) and extinction coefficient (k) were determined as a function of wavelength over the wavelength range from 400 to 800 nm using envelope methods.

Paper Details

Date Published: 3 April 2008
PDF: 6 pages
Proc. SPIE 6793, International Workshop and Conference on Photonics and Nanotechnology 2007, 67930J (3 April 2008); doi: 10.1117/12.799420
Show Author Affiliations
N. Witit-anun, King Mongkut's Institute of Technology Thonburi (Thailand)
P. Rakkwamsuk, King Mongkut's Institute of Technology Thonburi (Thailand)
P. Limsuwan, King Mongkut's Institute of Technology Thonburi (Thailand)


Published in SPIE Proceedings Vol. 6793:
International Workshop and Conference on Photonics and Nanotechnology 2007

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