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Proceedings Paper

Mask shot count reduction strategies in the OPC flow
Author(s): James Word; Keisuke Mizuuchi; Sai Fu; William Brown; Emile Sahouria
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Paper Abstract

Increasing pattern density and the higher complexity of advanced OPC and RET technologies have lead to an explosion in mask data volume. This increased data volume leads to increased mask write times, inspection times, and costs. In the past, several techniques for reducing the mask shot count have been proposed, including OPC fragment alignment, jog alignment, jog smoothing, and design intent-aware layout fragmentation among others. This paper will explore the tradeoffs between mask shot count and simulated print quality for various shot count reduction strategies.

Paper Details

Date Published: 19 May 2008
PDF: 11 pages
Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70283F (19 May 2008); doi: 10.1117/12.799410
Show Author Affiliations
James Word, Mentor Graphics Corp. (United States)
Keisuke Mizuuchi, Mentor Graphics Japan (Japan)
Sai Fu, Mentor Graphics Corp. (United States)
William Brown, Mentor Graphics Corp. (United States)
Emile Sahouria, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 7028:
Photomask and Next-Generation Lithography Mask Technology XV
Toshiyuki Horiuchi, Editor(s)

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