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Proceedings Paper

Design of pattern-specific mask grating for giving the effect of an off-axis illumination
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Paper Abstract

In order to realize the effect of pattern-specific off-axis illumination under the conventional circular illumination, the illumination method using a mask grating formed on the top side of a photo mask was evaluated and improved. Contrary to an off-axis illumination, it could provide the locally different off-axis illumination depending on the pattern shape defined on the bottom side of a mask. The structure of the mask grating was determined from the feature characteristics of the mask pattern and its performance was evaluated with the simulated Bossung curves.

Paper Details

Date Published: 2 May 2008
PDF: 10 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920R (2 May 2008); doi: 10.1117/12.798809
Show Author Affiliations
Young-Seok Kim, Inha Univ. (South Korea)
Seok Ho Song, Hanyang Univ. (South Korea)
Jong Ung Lee, Cheongju Univ. (South Korea)
Sung Hyun Oh, Hynix Semiconductor Inc. (South Korea)
Yong Kyoo Choi, Hynix Semiconductor Inc. (South Korea)
Munsik Kim, Hynix Semiconductor Inc. (South Korea)
Beom-Hoan O, Inha Univ. (South Korea)
Se-Geun Park, Inha Univ. (South Korea)
El-Hang Lee, Inha Univ. (South Korea)
Seung Gol Lee, Inha Univ. (South Korea)

Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)

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