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Proceedings Paper

Assessment and application of focus drilling for DRAM contact hole fabrication
Author(s): Christoph Noelscher; Franck Jauzion-Graverolle; Thomas Henkel
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Paper Abstract

By assessment of options for the fabrication of small contact holes in DRAM devices the method of focus drilling was identified and investigated to overcome the depth of focus limitations. By use of ArF-dry lithography a practical shrink of the target CD by 15nm can be achieved both with a focus offset double exposure (FODEX) and with a tilted stage approach. This was optimized in simulation and demonstrated by CD measurement on wafer, as well as by electrical measurement on integrated lots. Application of dual lambda focus drilling is limited by the chromatic magnification error of the lens. The increase of hole-to-hole CD variations due to a lower dose latitude and to increased MEEF was characterized. As improvement option the use of a high transmission attPSM was identified.

Paper Details

Date Published: 2 May 2008
PDF: 10 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920Q (2 May 2008); doi: 10.1117/12.798807
Show Author Affiliations
Christoph Noelscher, Qimonda Dresden GmbH & Co. OHG (Germany)
Franck Jauzion-Graverolle, Qimonda Dresden GmbH & Co. OHG (Germany)
Thomas Henkel, Qimonda Dresden GmbH & Co. OHG (Germany)

Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)

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