Share Email Print

Proceedings Paper

New results from DUV water immersion microscopy using the CD metrology system LWM500 WI with a high NA condenser
Author(s): Frank Hillmann; Gerd Scheuring; Hans-Jürgen Brück
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

New results using the world's first optical DUV mask CD (critical dimension) metrology system based on water immersion (WI) technology (Vistec LWM500 WI) are presented. In order to improve repeatability and linearity, especially for feature sizes smaller than 300 nm, a new condenser with an increased numerical aperture (NA) was integrated and qualified. Comparative investigations between the previously used 0.55 NA condenser and the new 0.8 NA condenser are shown and the resulting improvements by the high NA condenser are discussed. This report focuses on results obtained on ArF half tone phase shift masks which are more critical than KrF half tone or binary masks due to the mismatch between measurement and exposure wavelengths.

Paper Details

Date Published: 2 May 2008
PDF: 6 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 679215 (2 May 2008); doi: 10.1117/12.798803
Show Author Affiliations
Frank Hillmann, MueTec GmbH (Germany)
Gerd Scheuring, MueTec GmbH (Germany)
Hans-Jürgen Brück, MueTec GmbH (Germany)

Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)

© SPIE. Terms of Use
Back to Top