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Proceedings Paper

Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials
Author(s): Anna Klukowska; Marko Vogler; Anett Kolander; Freimut Reuther; Gabi Gruetzner; Michael Muehlberger; Iris Bergmair; Rainer Schoeftner
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Paper Abstract

The motivation for the presented research was the known issue of very expansive UV transparent stamps and moulds, which are necessary tools for UV-based patterning methods such as UV-based nanoimprint lithography, which has been developing as an attractive alternative lithography approach in recent 10 years. Low priced polymer working stamps could be an alternative to quartz as stamp material. UV transparent nanoimprint stamps were fabricated from sol-gel process-derived hybrid polymer, which has the benefit of high thermal, chemical and UV radiation stability. Tailored surface treatment and release agents were applied to ease the de-moulding process and secure the accuracy and fidelity of the transferred patterns. To increase the life time of the hybrid polymer nanoimprint stamps some adhesives between stamp substrate and the stamp material were used. The hybrid polymer stamps are compatible with NIL polymers and long-term stable even at elevated temperatures of thermal imprint processes.

Paper Details

Date Published: 2 May 2008
PDF: 8 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 67920J (2 May 2008); doi: 10.1117/12.798602
Show Author Affiliations
Anna Klukowska, micro resist technology GmbH (Germany)
Marko Vogler, micro resist technology GmbH (Germany)
Anett Kolander, micro resist technology GmbH (Germany)
Freimut Reuther, micro resist technology GmbH (Germany)
Gabi Gruetzner, micro resist technology GmbH (Germany)
Michael Muehlberger, Profactor Produktionsforschungs GmbH (Austria)
Iris Bergmair, Profactor Produktionsforschungs GmbH (Austria)
Rainer Schoeftner, Profactor Produktionsforschungs GmbH (Austria)

Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference

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