Share Email Print
cover

Proceedings Paper

Mask data rank (MDR) and its application
Author(s): Kokoro Kato; Masakazu Endo; Tadao Inoue; Masaki Yamabe
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

One of the ASET/MaskD2I target is the mask data prioritization and it effective uses for mask manufacturing issues. The MaskD2I and STARC have been working together to build efficient data flow based on the information transition from the design to the manufacturing level. By converting design level information called as "Design Intent" to the priority information of mask manufacturing data called as "Mask Data Rank (MDR)", MDP or manufacturing process based on the importance of reticle patterns is possible. Our main purpose is to build a novel data flow with the priority information of mask patterns extracted from the design intent. In this paper, we introduce the basic activities of the MaskD2I, and address the effectiveness of MDR information. Then we explain how to apply it to mask writing, inspection, MDP and MRC. We will show the new experimental results by extracted MDR from actual mask data provided by STARC.

Paper Details

Date Published: 2 May 2008
PDF: 8 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 679209 (2 May 2008); doi: 10.1117/12.798583
Show Author Affiliations
Kokoro Kato, Association of Super-Advanced Electronics Technologies (Japan)
Masakazu Endo, Association of Super-Advanced Electronics Technologies (Japan)
Tadao Inoue, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference

© SPIE. Terms of Use
Back to Top