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Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition techniqueFormat | Member Price | Non-Member Price |
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Paper Abstract
A new and optimized electromagnetic field (EMF) solver based on the waveguide method with a decomposition
technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The implemented
software algorithm enables full three dimensional (full 3D) mask simulations as well as three dimensional mask
simulations based on a parallelized decomposition technique (Q3D, "Q" stands for "quasi"). After a short introduction to
the waveguide method and to an optimized mask description, the basis of the decomposition technique and its
parallelization are presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated by
simulations of advanced optical and EUV imaging problems. Simulations of larger sized mask areas and of standard
sized defective EUV mask areas using the decomposition technique are shown. Finally, a further reduction of
computation time using parallelization is demonstrated.
Paper Details
Date Published: 2 May 2008
PDF: 10 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 679206 (2 May 2008); doi: 10.1117/12.798519
Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)
PDF: 10 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 679206 (2 May 2008); doi: 10.1117/12.798519
Show Author Affiliations
Feng Shao, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Peter Evanschitzky, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Peter Evanschitzky, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
David Reibold, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)
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