Share Email Print
cover

Proceedings Paper

Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique
Author(s): Feng Shao; Peter Evanschitzky; David Reibold; Andreas Erdmann
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A new and optimized electromagnetic field (EMF) solver based on the waveguide method with a decomposition technique for rigorous optical and extreme ultraviolet (EUV) mask near field simulations is presented. The implemented software algorithm enables full three dimensional (full 3D) mask simulations as well as three dimensional mask simulations based on a parallelized decomposition technique (Q3D, "Q" stands for "quasi"). After a short introduction to the waveguide method and to an optimized mask description, the basis of the decomposition technique and its parallelization are presented. Subsequently the capabilities of the new electromagnetic field solver are demonstrated by simulations of advanced optical and EUV imaging problems. Simulations of larger sized mask areas and of standard sized defective EUV mask areas using the decomposition technique are shown. Finally, a further reduction of computation time using parallelization is demonstrated.

Paper Details

Date Published: 2 May 2008
PDF: 10 pages
Proc. SPIE 6792, 24th European Mask and Lithography Conference, 679206 (2 May 2008); doi: 10.1117/12.798519
Show Author Affiliations
Feng Shao, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Peter Evanschitzky, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
David Reibold, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)
Andreas Erdmann, Fraunhofer Institute of Integrated Systems and Device Technology (Germany)


Published in SPIE Proceedings Vol. 6792:
24th European Mask and Lithography Conference

© SPIE. Terms of Use
Back to Top