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Proceedings Paper

Bulk-micromachined dielectric tunable optical filter realized with inductively coupled plasma chemical vapour deposition
Author(s): Sandro Jatta; Klaus Haberle; Kuldip Singh; Benjamin Koegel; Hubert Halbritter; Peter Meissner
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Paper Abstract

We present the characterization of silicon oxide (SiOx) and silicon nitride (SiNx) films deposited by inductively coupled plasma chemical vapour deposition (ICP-CVD) at low temperature (< 100°C). A tunable optical Fabry- Perot (FP) -filter operating at a wavelength around 1.5μm is realized. It is hybridly assembled with two dielectric distributed Bragg reflectors (DBR). One of the DBR- mirrors is intentionally curved using the intrinsic stress inside the films. Our aim is the development of a tunable surface micromachined VCSEL with a curved dielectric mirror. Therefore ICP-CVD with a low deposition temperature is used for SiOx and SiNx films. As a first step the realization of a tunable bulk- mircomachined optical FP- filter is presented. The refractive index, deposition rate, stress and etching rate in buffered hydrofluoric acid (BHF) of thin dielectric films (<500 nm) in dependence on deposition temperature and on gas flow ratio are investigated. The knowledge of the deposition characteristics of the dielectric films is used to realize DBRs with a given curvature that are applied to electrothermally actuated, optical tunable FP- filters. The presented filter has a free spectral range of 29 nm, an insertion loss of 10 dB and a full width half maximum of 0.16 nm.

Paper Details

Date Published: 25 September 2008
PDF: 11 pages
Proc. SPIE 7101, Advances in Optical Thin Films III, 71011D (25 September 2008); doi: 10.1117/12.797755
Show Author Affiliations
Sandro Jatta, Technische Univ. Darmstadt (Germany)
Klaus Haberle, Technische Univ. Darmstadt (Germany)
Kuldip Singh, Central Electronics Engineering Research Institute (India)
Benjamin Koegel, Technische Univ. Darmstadt (Germany)
Hubert Halbritter, Technische Univ. Darmstadt (Germany)
Peter Meissner, Technische Univ. Darmstadt (Germany)


Published in SPIE Proceedings Vol. 7101:
Advances in Optical Thin Films III
Norbert Kaiser; Michel Lequime; H. Angus Macleod, Editor(s)

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