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Proceedings Paper

Dynamic x-ray lithography for blazed diffractive optics fabrication
Author(s): V. F. Pindyurin; B. G. Goldenberg; E. V. Petrova; U. V. Ancharova; V. S. Eliseev; V. P. Korolkov; R. K. Nasyrov
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Paper Abstract

Application of dynamic X-ray lithography for originating of continuous-relief diffractive optical elements and microoptics has been investigated. The method is based on action of X-ray irradiation passed through fixed X-ray mask with triangle-like openings to periodically moved PMMA wafer. PMMA samples were exposed on synchrotron radiation facility VEPP-3 (BINP SB RAS, Novosibirsk) and then etched in liquid developer to form surface relief. Advances and limitations of the method have been discussed. Application of dynamic X-ray lithography with moving wafer to fabrication of gradient diffractive optical elements in PMMA wafer has been demonstrated.

Paper Details

Date Published: 25 September 2008
PDF: 11 pages
Proc. SPIE 7102, Optical Fabrication, Testing, and Metrology III, 710208 (25 September 2008); doi: 10.1117/12.797728
Show Author Affiliations
V. F. Pindyurin, Budker Institute of Nuclear Physics (Russia)
B. G. Goldenberg, Budker Institute of Nuclear Physics (Russia)
E. V. Petrova, Budker Institute of Nuclear Physics (Russia)
U. V. Ancharova, Budker Institute of Nuclear Physics (Russia)
V. S. Eliseev, Budker Institute of Nuclear Physics (Russia)
V. P. Korolkov, Institute of Automation and Electrometry (Russia)
R. K. Nasyrov, Institute of Automation and Electrometry (Russia)


Published in SPIE Proceedings Vol. 7102:
Optical Fabrication, Testing, and Metrology III
Angela Duparré; Roland Geyl, Editor(s)

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