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Proceedings Paper

Low-stress glue-free mounting technology for optical elements
Author(s): Lutz Reichmann; Oliver Falkenstörfer; Ullrich Krüger; Thomas Schletterer; Matthias Bening; Marco Bornschein
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Paper Abstract

Jenoptik Laser, Optik, Systeme GmbH has developed a new mounting technology for optical elements. It is free of any glue or other organic material whereby it is excellently appropriate to the use for DUV Systems, especially if high intensity occurs as it is to be found in illuminating systems. The new technology has been successfully applied in high quality lenses e.g. in a high NA inspection lens @266nm and several ultra high quality imaging systems @193nm. The so called Clamp Mount Technology is characterized by high accuracy and stability under environmental influence such as shock, vibration or thermal effects. There is no limitation in use with any optical material e.g. fused silica or calcium fluoride. The lens cells are routinely optimized by finite element method. Thus in advance clamp force is optimized having regard to deformation of optical surfaces, lens shape, lens weight, gravity and shock load. Additionally stress induced polarization effects are predictable. The FEM simulation results can be transferred to optical design tools which are used for lens design as much as for comparing design data with experimental results.

Paper Details

Date Published: 27 September 2008
PDF: 7 pages
Proc. SPIE 7100, Optical Design and Engineering III, 71001B (27 September 2008); doi: 10.1117/12.797715
Show Author Affiliations
Lutz Reichmann, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Oliver Falkenstörfer, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Ullrich Krüger, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Thomas Schletterer, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Matthias Bening, JENOPTIK Laser, Optik, Systeme GmbH (Germany)
Marco Bornschein, JENOPTIK Laser, Optik, Systeme GmbH (Germany)

Published in SPIE Proceedings Vol. 7100:
Optical Design and Engineering III
Laurent Mazuray; Jean-Luc Tissot; Jeffrey M. Raynor; Rolf Wartmann; Andrew Wood, Editor(s)

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