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Proceedings Paper

Sputter process with time-variant reactive gas mixture for the deposition of optical multilayer and gradient layer systems
Author(s): H. Bartzsch; J. Weber; K. Lau; D. Glöß; P. Frach
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Paper Abstract

Magnetron sputtering of a silicon target in a time-variant mixture of the reactive gases oxygen and nitrogen allows the deposition of optical multilayer and gradient layer systems of silicon oxinitride at one stationary sputtering station. In this paper the processes within the sputter discharge and the properties of the growing film during the change of the reactive gas composition are investigated using optical in-situ monitoring, optical plasma emission spectroscopy and plasma impedance monitoring. A time delay between the change to the reactive gas composition and the resulting change to the film composition was observed. The time delay is longer for the transition from oxide to nitride deposition then vice versa. This asymmetry is attributed to the different affinity of nitrogen and oxygen to the silicon target. Examples of deposited antireflective coatings as well as rugate filters based on silicon oxinitride multilayer and gradient layer designs are given.

Paper Details

Date Published: 25 September 2008
PDF: 8 pages
Proc. SPIE 7101, Advances in Optical Thin Films III, 71010J (25 September 2008); doi: 10.1117/12.797693
Show Author Affiliations
H. Bartzsch, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (Germany)
J. Weber, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (Germany)
K. Lau, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (Germany)
D. Glöß, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (Germany)
P. Frach, Fraunhofer-Institut für Elektronenstrahl- und Plasmatechnik (Germany)


Published in SPIE Proceedings Vol. 7101:
Advances in Optical Thin Films III
Norbert Kaiser; Michel Lequime; H. Angus Macleod, Editor(s)

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