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Proceedings Paper

Angle-resolved reflectometer for thickness measurement of multi-layered thin-film structures
Author(s): Woo-Deok Joo; Joonho You; Young-Sik Ghim; Seung-Woo Kim
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Paper Abstract

The principle of angle-resolved reflectometry is exploited for thin-film thickness measurements. Within an optical microscope equipped with a high NA objective, a sequence of quasi-monochromatic light of different wavelengths is generated from a white-light source through spectral filters. Then for each wavelength, the reflectance intensity from the thin-film sample is monitored on the back focal plane of the objective. This enables collection of reflectance with varying incident angles. The film thickness is then uniquely determined by fitting the measured data to an ideal multi-reflection model of thin films. This method can be readily extended to multi-layered film structures, finding applications for industrial inspection of semiconductor devices and flat panel display products.

Paper Details

Date Published: 11 August 2008
PDF: 8 pages
Proc. SPIE 7063, Interferometry XIV: Techniques and Analysis, 70630Q (11 August 2008); doi: 10.1117/12.797523
Show Author Affiliations
Woo-Deok Joo, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Joonho You, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Young-Sik Ghim, Korea Advanced Institute of Science and Technology (Korea, Republic of)
Seung-Woo Kim, Korea Advanced Institute of Science and Technology (Korea, Republic of)


Published in SPIE Proceedings Vol. 7063:
Interferometry XIV: Techniques and Analysis
Joanna Schmit; Katherine Creath; Catherine E. Towers, Editor(s)

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