Share Email Print
cover

Proceedings Paper

Reliable production of steep edge interference filters
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Interference filters for spectroscopic purposes or sensor applications are characterized by strictly specified spectral blocking and transmitting regions with intermediate steep edges. These steep edges must be positioned within nanometer accuracy while the coating may consist of more than one hundred non-quarterwave layers. Though modern ion assisted deposition processes in conjunction with quartz crystal control are well suited for the production of complex filters, an optical monitoring device seems to be necessary to fulfill the demanding spectral requirements. Broad band optical monitoring (BBM) directly on the calotte has been employed to control the production of this type of band stop filters. For a large number of also different types of these coatings the BBM-technique demonstrated its capability to improve the reliability and flexibility in industrial production. Within a stable well-characterized deposition process error self-compensation effects allow for a fast realization of various designs within specified tolerances. Nevertheless, optical broad band monitoring could not be applied to all types of these steep edge filters because error propagation leads to unreachable solutions of the thickness tracing algorithm for specific cases. The given examples of complex steep filters and the corresponding post analysis of stored online spectra as well as the simulation of the monitoring process reveal the influence of the design itself to this occurrence. A suggestion for an identification of critical thickness values within the layer sequence is discussed and solutions to the problems are presented.

Paper Details

Date Published: 25 September 2008
PDF: 8 pages
Proc. SPIE 7101, Advances in Optical Thin Films III, 71010P (25 September 2008); doi: 10.1117/12.797459
Show Author Affiliations
Marc Lappschies, mso jena Mikroschichtoptik GmbH (Germany)
Peter Pfeifer, mso jena Mikroschichtoptik GmbH (Germany)
Uwe Schallenberg, mso jena Mikroschichtoptik GmbH (Germany)
Henrik Ehlers, Laser Zentrum Hannover (Germany)
Detlev Ristau, Laser Zentrum Hannover (Germany)


Published in SPIE Proceedings Vol. 7101:
Advances in Optical Thin Films III
Norbert Kaiser; Michel Lequime; H. Angus Macleod, Editor(s)

© SPIE. Terms of Use
Back to Top