Share Email Print
cover

Proceedings Paper

Structural and electrical properties of low temperature deposited ITO films
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Highly transparent thin films of indium tin oxide are important for different kinds of optical and electrical applications. So far, deposition of these materials has been limited to high temperature processes. This study describes a plasma ion-assisted evaporation process with substrate temperatures below 100°C and correlates the structural and electrical properties of the coatings with the process parameters. The influence of gas-mixture, mean ion energy and temperature has been investigated by four-point-measurement, atomic force microscopy, scanning electron microscopy and x-ray spectroscopy. The coatings exhibit mean extinction coefficients of 7•10-3 in the VIS range and specific resistivities in the range of 4.0 μΩm.

Paper Details

Date Published: 25 September 2008
PDF: 8 pages
Proc. SPIE 7101, Advances in Optical Thin Films III, 71010O (25 September 2008); doi: 10.1117/12.797255
Show Author Affiliations
Kevin Füchsel, Friedrich-Schiller-Univ. (Germany)
Fraunhofer-Institute of Applied Optics and Precision Engineering (Germany)
Ulrike Schulz, Fraunhofer-Institute of Applied Optics and Precision Engineering (Germany)
Norbert Kaiser, Fraunhofer-Institute of Applied Optics and Precision Engineering (Germany)
Andreas Tünnermann, Friedrich-Schiller-Univ. (Germany)
Fraunhofer-Institute of Applied Optics and Precision Engineering (Germany)


Published in SPIE Proceedings Vol. 7101:
Advances in Optical Thin Films III
Norbert Kaiser; Michel Lequime; H. Angus Macleod, Editor(s)

© SPIE. Terms of Use
Back to Top