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Proceedings Paper

New developments in magnetron sputter processes for precision optics
Author(s): Michael Vergöhl; Oliver Werner; Stefan Bruns
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Paper Abstract

Reactive magnetron sputtering processes have gained considerable interest for the production of precision optical coatings. Pulsed sputtering techniques allow the deposition of high quality optical materials at high deposition rates. However, under high throughput conditions and with tight spectral tolerances, process stabilization has to be included in the fabrication process. Normally, pulsed magnetron sputter techniques are typically characterized by a low ionization. Very recently, ionized magnetron sputtering techniques are under investigation, where either the reactive gas or the metallic sputtered particles are highly ionized. Plasma assisted reactive magnetron sputtering ("PARMS") using an additional plasma source or the high pulse power magnetron sputtering ("HiPIMS" or "HPPMS") can be applied therefore. The present paper gives results of film properties of optical materials obtained with these ionized magnetron sputtering techniques and discusses potentials of the techniques for the use with precision optics.

Paper Details

Date Published: 25 September 2008
PDF: 17 pages
Proc. SPIE 7101, Advances in Optical Thin Films III, 71010B (25 September 2008); doi: 10.1117/12.797190
Show Author Affiliations
Michael Vergöhl, Fraunhofer Institute for Surface Engineering and Thin Films (Germany)
Oliver Werner, Fraunhofer Institute for Surface Engineering and Thin Films (Germany)
Stefan Bruns, Fraunhofer Institute for Surface Engineering and Thin Films (Germany)


Published in SPIE Proceedings Vol. 7101:
Advances in Optical Thin Films III
Norbert Kaiser; Michel Lequime; H. Angus Macleod, Editor(s)

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